I. Corporate Profile & Statutory Registry Records
| Official Chinese Name | 正浩實業有限公司 | Official English Name | RIGHT HONOUR INDUSTRIAL LIMITED |
|---|---|---|---|
| Company Reg No. (CRN) | 0761912 | Business Reg No. (BRN) | 31999339 |
| Incorporation Date | 2001-06-29 | Company Category | Private company limited by shares |
| Current Legal Status | Dissolved | Dissolution Date | Statutory Records |
| Registered Office Address | ROOM 3, 8/F, BLOCK B, HI-TECH INDUSTRIAL CENTRE, 491-501 CASTLE PEAK ROAD, TSUEN WAN, NEW TERRITORIES, HONG KONGHi-Tech Industrial Centre · View Co-Located Entities → | ||
|---|---|---|---|
| Significant Controllers (SCR) | Statutorily maintained. To penetrate ultimate beneficial owners (UBO) and holding structures, please apply for a Due Diligence Report. | ||
II. Companies Registry Historical Filing Retrieval(NAR1 Annual Return / Gazette Notice / ND2A)
| Document Name | Action | |||||
|---|---|---|---|---|---|---|
Historical Filings for Dissolved Entity Require Archival Retrieval
This corporate entity is dissolved. Pursuant to the Companies Ordinance (Cap. 622), pre-dissolution Annual Returns (NAR1), Incorporation Forms (NNC1), director changes, or winding-up/deregistration filings can be retrieved via our dedicated compliance specialist. | ||||||
III. Commercial Due Diligence & Regulatory Risk Screening
Historical Dissolved Entity Summary: Official cross-screening across Hong Kong statutory registers confirms no regulatory licences (32 regulators), no public court litigation or compulsory winding-up petitions (HCCW), and no global sanction matches on file for this dissolved corporation. Last recorded pre-dissolution statutory registered office: ROOM 3, 8/F, BLOCK B, HI-TECH INDUSTRIAL CENTRE, 491-501 CASTLE PEAK ROAD, TSUEN WAN, NEW TERRITORIES, HONG KONG.
V. Similar Trade Names & Industry Directory
INDUSTRY & SURVIVAL BENCHMARK
Historical Dissolved RecordDissolvedDissolvedInc. 2001-06-29
Entity has exited the Live Register; compare with active peers in the same industry or naming cluster below.
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