EVER RICH (CHINA & HK) ENGINEERING LIMITED

Yes. In statutory due diligence and corporate verification, EVER RICH (CHINA & HK) ENGINEERING LIMITED is authenticated as a lawful Private company limited by shares established on 2002-02-15 under the Companies Ordinance (Cap. 622) (duration: 24 years). Official registry indices confirm its current standing as [Live / In Operation] with active corporate capacity (Last verified: October 2026).

Official Hong Kong government registers assign two statutory identifiers to EVER RICH (CHINA & HK) ENGINEERING LIMITED: 1. Business Registration Number (BRN / UBI): [32386654] (statutory identifier for tax and commercial registration under Cap. 310); 2. Company Registration Number (CRN): [0786291] (statutory filing number under Cap. 622). Commercial counterparties should verify both numbers on contracts and invoices.

In Hong Kong corporate compliance and banking KYC due diligence, verifying the decision-makers of EVER RICH (CHINA & HK) ENGINEERING LIMITED requires cross-checking three statutory filings: 1. Latest Annual Return (Form NAR1) for issued share capital and shareholder equity percentages; 2. Form ND2A (Notice of Change of Company Secretary and Director) for interim board changes after the annual return date; and 3. Significant Controllers Register (SCR) penetration for natural persons or holding entities exercising ultimate control (UBO).

In Hong Kong corporate registration records, EVER RICH (CHINA & HK) ENGINEERING LIMITED has officially logged 19 statutory image filing(s) since incorporation (latest statutory filing indexed on 2023-12-27: Reference Document for Business Registration Number as UBI). Key authenticated filings include the latest Annual Return (Form NAR1 pursuant to Cap. 622 Section 662 - recording verified capital allocation, registered address, and director registers), original Incorporation documents (Form NNC1), and constitutional records, all authenticated with official ICRIS / e-Registry barcodes.

According to multi-dimensional checks across Hong Kong statutory authorities: 1. Regulatory Register Screening: Multi-agency verification across Hong Kong statutory regulators confirms EVER RICH (CHINA & HK) ENGINEERING LIMITED does not hold special administrative or financial licences (such as SFC, HKMA, TCSP, or MSO), engaging in general commercial operations under the Companies Ordinance (Cap. 622); 2. Judicial Screening (Litigation & Winding-Up): screened against Hong Kong Judiciary cause books and winding-up registers under the Companies (Winding Up and Miscellaneous Provisions) Ordinance (Cap. 32), with zero public compulsory winding-up petitions (HCCW) or civil litigation dockets currently indexed.

The statutory registered office of EVER RICH (CHINA & HK) ENGINEERING LIMITED is registered at: [ROOM C, 3/F, ON LUNG FACTORY BUILDING, 11-13 LUK HOP STREET, SAN PO KONG, HONG KONG]. Official registry dossiers also record 1 statutory registered office address change filing(s) (Form NR1). In accordance with Cap. 622 Section 658 and Cap. 622B Section 3, this Hong Kong address serves as the statutory venue for inspection of statutory registers, service of government and judicial process, and mandatory display of the corporation's full legal name.

Before entering into cross-border trade, credit settlement, or joint venture agreements with EVER RICH (CHINA & HK) ENGINEERING LIMITED (CRN: 0786291 / 8-digit BRN: 32386654), standard institutional due diligence under Hong Kong law comprises four core verifications: 1. Standing & Identifier Match: Cross-checking active status under Cap. 622 and its 8-digit BRN under Cap. 310; 2. Equity & Signatory Penetration: Inspecting the latest Annual Return (Form NAR1) and Form ND2A to verify paid-up share capital, shareholders, and authorized signatory directors; 3. Register of Charges Screening: Checking Form NM1 filings under Part 8 (Section 334) of Cap. 622 for pledged corporate assets or bank floating charges; and 4. Judicial Screening: Verifying the absence of High Court winding-up petitions (HCCW) or civil litigation writs.